TMHD Precursors for Optical Coatings
High-purity halide-free oxide deposition for AR and filter coatings
For optical coating engineers depositing ZrO₂ and rare-earth oxide films by ALD/CVD
Your Challenge. Our Answer.
We understand the specific problems you face — and we built solutions for each one.
The Problem
Halide contamination from chloride precursors creates absorption sites that degrade optical performance in AR and filter coatings
Mironova’s Answer
TMHD precursors are entirely halide-free — no Cl or F contamination. Stoichiometric, high-transparency oxide films.
The Problem
Precursor instability in heated delivery lines leads to particle generation and coating defects
Mironova’s Answer
TMHD ligands provide exceptional thermal stability during transport, minimizing particulate contamination
Published Evidence
Key findings from peer-reviewed literature relevant to your application.
High-Purity ZrO₂ Films
Zr(TMHD)₄/O₃ ALD produces stoichiometric ZrO₂ with <0.5 at.% C and H impurities — suitable for optical-grade coatings.
Putkonen et al., J. Mater. Chem. 2001
Halide-Free Advantage
Halide precursors leave 1–3 at.% residual Cl that creates absorption sites in optical films. TMHD eliminates this pathway.
Park et al., J. Phys. Chem. C 2016
Recommended Products
The specific products from our catalog that match your application.
Optical Coating ALD Parameters
- Zr(TMHD)₄/O₃: 375–400 °C, GPC 0.24 Å/cycle
- Gd(TMHD)₃/O₃: 250–300 °C, GPC ~0.3 Å/cycle
- Sublimation-grade purity minimizes optical scattering
- Ozone (O₃) required as oxidant
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