Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III)
Also known as: Y(TMHD)₃, Yttrium(III) TMHD, Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium, Y(thd)₃
High-purity yttrium beta-diketonate precursor for CVD and ALD of yttrium oxide and yttria-stabilized zirconia (YSZ) thin films. Critical for solid oxide fuel cells, thermal barrier coatings, and high-k dielectric stacks.
Product Information
CAS Number
15632-39-0
Molecular Formula
C₃₃H₅₇O₆Y
Molecular Weight
638.68 g/mol
Prices and lead time available upon request
Product Documents
Safety Data Sheet (SDS)
Available on request
Product Specification
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Certificate of Analysis
Provided with order
Overview
Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III), abbreviated Y(TMHD)₃, is an yttrium beta-diketonate complex used as a precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of yttrium oxide (Y₂O₃) and yttria-containing composite films such as yttria-stabilized zirconia (YSZ). The TMHD ligand framework provides the volatility and thermal stability needed for reliable vapor-phase yttrium delivery across a broad range of deposition processes.
Key Advantages
- High Purity: ≥99.0% with controlled rare-earth impurity levels critical for YSZ electrolyte performance
- Established in YSZ Co-deposition: Routinely combined with Zr(TMHD)₄ for precise yttria doping of zirconia films
- Good Sublimation Characteristics: Compatible with standard bubbler and solid-source ALD/CVD delivery
- Clean Decomposition: Yields Y₂O₃ films with low carbon and halide contamination
- Inert Atmosphere Packaging: Sealed to prevent moisture uptake during storage and shipping
Applications
Yttria-Stabilized Zirconia (YSZ)
Y(TMHD)₃ co-deposited with Zr(TMHD)₄ is the classic CVD/ALD route to YSZ thin films — the gold-standard solid electrolyte for solid oxide fuel cells (SOFCs) and oxygen sensors, where precise 8–10 mol% yttria doping is required to stabilize the cubic fluorite phase.
Thermal Barrier Coatings (TBC)
Y₂O₃-stabilized ZrO₂ deposited from Y(TMHD)₃/Zr(TMHD)₄ mixtures provides thermal barrier coatings on turbine components and aerospace structures, exploiting the low thermal conductivity and phase stability of YSZ at elevated temperatures.
High-k Dielectrics
Y₂O₃ films and Y-doped HfO₂ dielectrics deposited from Y(TMHD)₃ are investigated as high-k gate dielectrics in advanced CMOS logic nodes, where yttrium doping modulates the dielectric constant and crystallization temperature.
Optical Coatings
Y₂O₃ is a wide-bandgap, optically transparent oxide used in UV-transmitting optical coatings, anti-reflection layers, and protective films on optical components for UV lithography and laser applications.
Manufacturing Capabilities
We offer Y(TMHD)₃ from research quantities (500g) to production scale with consistent quality. Custom packaging under inert atmosphere available. Glass packaging required for all orders.
Important Safety Information
Warning: This compound should be handled by qualified professionals in a laboratory environment. Store under inert atmosphere to prevent hydrolysis. Use appropriate PPE including gloves, safety glasses, and lab coat. Refer to SDS for complete safety information.
Related Resources
Technical data, product specifications, and application guidance.
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