Products/Metal Organic Precursors/Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate)

Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate)

Also known as: Cu(TMHD)₂, Copper(II) TMHD, Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), Cu(thd)₂

High-purity copper beta-diketonate precursor for CVD and ALD applications. Ideal for depositing copper and copper oxide thin films in semiconductor interconnect, catalysis, and transparent conductor applications.

Chemical Structure

Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate) chemical structure

Product Information

CAS Number

14040-11-0

Molecular Formula

C₂₂H₃₈CuO₄

Molecular Weight

430.07 g/mol

Prices and lead time available upon request

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Product Documents

Safety Data Sheet (SDS)

Available on request

Product Specification

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Certificate of Analysis

Provided with order

Overview

Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate), commonly abbreviated as Cu(TMHD)₂, is a volatile copper beta-diketonate complex widely used as a precursor for chemical vapor deposition (CVD) and atomic layer deposition (ALD) of copper and copper oxide thin films. The bulky TMHD ligands impart favorable volatility and thermal behavior, making this compound well-suited for vapor-phase deposition processes targeting Cu, Cu₂O, and CuO films.

Key Advantages

Cu(TMHD)₂ offers several distinct advantages for thin film deposition:

  • Good Volatility: Sublimes at moderate temperatures suitable for CVD/ALD delivery systems
  • Versatile Oxidation States: Can yield Cu⁰, Cu₂O, or CuO depending on process atmosphere
  • Thermal Controllability: Decomposes cleanly under appropriate conditions
  • Established Chemistry: Well-characterized behavior in vapor deposition literature
  • High Purity Available: Electronic-grade material for demanding semiconductor applications

Applications

Semiconductor Interconnects

Used for depositing copper seed layers and copper oxide barrier films in advanced interconnect structures, enabling low-resistivity metal lines at reduced feature sizes.

Catalysis & Sensing

Copper oxide thin films deposited from this precursor are active catalysts for oxidation reactions and gas sensing platforms, including CO oxidation and VOC detection.

Transparent Conductors & Photovoltaics

Cu₂O films produced via CVD/ALD have applications in p-type transparent conductors and as absorber layers in thin-film solar cells.

Magnetic & Spintronic Devices

Controlled deposition of copper oxide films enables integration into spintronic device stacks requiring precise interface engineering.

Manufacturing Capabilities

We offer Cu(TMHD)₂ from research quantities (25g) to production scale with consistent quality. Custom packaging under inert atmosphere available for air-sensitive handling requirements.

Important Safety Information

Warning: This compound should be handled by qualified professionals in a laboratory environment. Store under inert atmosphere and away from light to prevent decomposition. Use appropriate PPE including gloves, safety glasses, and lab coat. Refer to SDS for complete safety information.

Questions About This Product?

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